Dr. Chang-Min Park
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Reticles, Logic, Scanners, Manufacturing, Pellicles, Transmittance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical elements

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Deep ultraviolet, Etching, Scanners, Particles, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

SPIE Journal Paper | 18 March 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Reticles, Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Oxides, Electron beam lithography, Etching, Quartz, Silicon, Chromium, Photomasks, Line width roughness, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Thin films, Contamination, Data modeling, Calibration, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 19 publications
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