Dr. Chang-Nam Ahn
Imaging Scientist at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (28)

PROCEEDINGS ARTICLE | May 2, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Reticles, Optical lithography, Lithographic illumination, Printing, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | May 1, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Lithographic illumination, Cadmium, Photomasks, Extreme ultraviolet, Compact discs, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Diffraction gratings

PROCEEDINGS ARTICLE | April 7, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Particles, Photomasks, Extreme ultraviolet, Line width roughness, Immersion lithography, Critical dimension metrology, Photoresist processing, Stochastic processes, Absorption

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Metrology, Liquid phase epitaxy, Etching, Error analysis, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Critical dimension metrology, Stochastic processes

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Quartz, Ions, Atomic force microscopy, Photomasks, Critical dimension metrology, Reactive ion etching, Plasma, Phase shifts

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Diffractive optical elements, Physics, Photomasks, Critical dimension metrology, Acoustics, Photoresist processing, Semiconducting wafers, Standards development, Temperature metrology

Showing 5 of 28 publications
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