Dr. Chang-Nam Ahn
Imaging Scientist at ASML Korea Co Ltd
SPIE Involvement:
Publications (29)

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 116090D (2021) https://doi.org/10.1117/12.2583462
KEYWORDS: Reflectivity, Extreme ultraviolet, Photomasks, Optical design, Manufacturing, Ruthenium, Printing, Etching, Nanoimprint lithography, Absorption

Proceedings Article | 2 May 2018 Presentation + Paper
Jo Finders, Ziyang Wang, John McNamara, Gijsbert Rispens, Pär Broman, Chang-Nam Ahn, Inhwan Lee, Hwan Kim, Junghyun Kang, Yoonsuk Hyun, Chang-Moon Lim
Proceedings Volume 10583, 105830Y (2018) https://doi.org/10.1117/12.2299598
KEYWORDS: Nanoimprint lithography, Lithographic illumination, Photomasks, Fiber optic illuminators, Diffraction, Extreme ultraviolet lithography, Reticles, Printing, Semiconducting wafers, Optical lithography

Proceedings Article | 1 May 2018 Presentation + Paper
Proceedings Volume 10583, 105830X (2018) https://doi.org/10.1117/12.2299322
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Stochastic processes, Diffraction, Compact discs, Diffraction gratings, Cadmium, Lithographic illumination

Proceedings Article | 7 April 2015 Paper
Seo-Min Kim, Chang-Moon Lim, Mi-Rim Jung, Young-Sik Kim, Won-Taik Kwon, Chang-Nam Ahn, Kyu-Tae Sun, Anita Fumar-Pici, Alek Chen
Proceedings Volume 9422, 94220M (2015) https://doi.org/10.1117/12.2087559
KEYWORDS: Stochastic processes, Photomasks, Absorption, Critical dimension metrology, Extreme ultraviolet, Immersion lithography, Lithography, Photoresist processing, Line width roughness, Particles

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90480A (2014) https://doi.org/10.1117/12.2048282
KEYWORDS: Etching, Liquid phase epitaxy, Stochastic processes, Photomasks, Metrology, Critical dimension metrology, Printing, Scanning electron microscopy, Extreme ultraviolet, Error analysis

Showing 5 of 29 publications
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