Chang-Young Hong
Photolithography Process Development Engineer at Rohm and Haas Electronic Materials, LLC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 25 March 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Photoresist materials, Lithography, Thin films, Chemistry, Molecules, Diffusion, Materials processing, Photoresist processing, Optical lithography, Optical proximity correction, Ions, Polymers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Standards development, Critical dimension metrology, Logic, Photoresist developing, Semiconducting wafers, Double patterning technology, Process control, Photoresist processing, Electroluminescence, Photomasks

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top