Chang Young Jeong
at Hanyang Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 21 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Deep ultraviolet, Image processing, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Molybdenum, Binary data, Phase shifts

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