Dr. ChangAn Wang
at ASML US Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Calibration, Error analysis, Diffusion, 3D modeling, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling, Process modeling, Photo decomposable quencher

Proceedings Article | 22 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Genetic algorithms, Matrices, Image processing, Silicon, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Algorithm development, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 25 October 2016 Paper
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Genetic algorithms, Computer simulations, Printing, Photomasks, Optical proximity correction, SRAF, Algorithm development, Optimization (mathematics), Semiconducting wafers, Model-based design

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photomasks, Source mask optimization, Semiconducting wafers, Tolerancing, Performance modeling

Showing 5 of 13 publications
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