Mr. Changho Noh
at Samsung Advanced Institute of Technology
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical lithography, Metals, Ultraviolet radiation, Copper, Nickel, Ions, Silver, Photomasks, Palladium, Electroless plating

PROCEEDINGS ARTICLE | July 24, 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Transparency, Etching, Polymers, Resistance, Carbonates, Photoresist materials, Absorbance, Systems modeling, Plasma

PROCEEDINGS ARTICLE | August 24, 2001
Proc. SPIE. 4345, Advances in Resist Technology and Processing XVIII
KEYWORDS: Lithography, Deep ultraviolet, Polymers, Image processing, Chemistry, Carbonates, Photoresist materials, Photomasks, Line edge roughness, Binary data

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top