Dr. Changwoo Lee
at Lam Research Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Logic, Optical lithography, Etching, Inspection, Extreme ultraviolet, Plasma etching, Critical dimension metrology, Data centers, Semiconducting wafers, Front end of line

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Optical lithography, Etching, Ions, Photomasks, Extreme ultraviolet, Line width roughness, Plasma etching, Extreme ultraviolet lithography, Line edge roughness, Plasma

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top