Dr. Changyoung Jeong
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 25 March 2019
Proc. SPIE. 10960, Advances in Patterning Materials and Processes XXXVI
KEYWORDS: Optical lithography, Polymers, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness, Chemically amplified resists

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Polymers, Molecules, Electrons, Diffusion, Photoresist materials, Finite difference methods, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness

Proceedings Article | 24 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Semiconductors, Polymers, Molecules, Electrons, Diffusion, Computer simulations, Photoresist materials, Monte Carlo methods, Extreme ultraviolet lithography, Chemical reactions, Line edge roughness, Photochemistry, Photoresist processing, Photoresist developing

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Defect detection, Inspection, Photomasks, Extreme ultraviolet, Bismuth, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Defect inspection

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Semiconductors, Lithography, Scanners, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

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