Dr. Chansam Chang
Senior Engineer
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 24 March 2017 Presentation + Paper
Bram van Hoof, Arjan Holscher, Ralf Gommers, Jeroen Cottaar, Marcel Raas, Samah Khalek, Jan van Kemenade, Maarten Voncken, Roelof de Graaf, Elliot Oti, Stefan Weichselbaum, Richard Droste, ByeongSoo Lee, Chansam Chang, Young Seog Kang, Young Ha Kim, Jeong-Heung Kong, Jong Hoon Jang, YoungSun Nam, Hyunwoo Hwang
Proceedings Volume 10147, 101471A (2017) https://doi.org/10.1117/12.2259794
KEYWORDS: Semiconducting wafers, Sensors, Time metrology, Scanners, Optical alignment, Calibration, Wafer testing, Overlay metrology, Metrology, Computer programming

Proceedings Article | 15 March 2016 Paper
Jonghoon Jang, ByeongSoo Lee, Young Seog Kang, Chansam Chang, Jeong-Heung Kong, Young Ha Kim, Wim Bouman, Roelof de Graaf, Stefan Weichselbaum, Richard Droste, Wim de Boeij, Bart van Bussel, Patrick Neefs, Arij Rijke
Proceedings Volume 9780, 97800X (2016) https://doi.org/10.1117/12.2220588
KEYWORDS: Lithography, Lithographic illumination, Optical alignment, Scanners, Optical lithography, Image enhancement, Reticles, Electronics

Proceedings Article | 16 April 2011 Paper
J. M. Gomez, I. Popova, B. Zhang, H. Kry, S. Holmes, S. Nakagawa, T. Murakami, Chan Sam Chang, Cheol Kim
Proceedings Volume 7972, 79722T (2011) https://doi.org/10.1117/12.879866
KEYWORDS: Photoresist processing, Lithography, Germanium, Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Reflectivity, Etching, Scanners

Proceedings Article | 4 April 2011 Paper
Henning Haffner, Martin Ostermayr, Hideki Kanai, Chan Sam Chang, Bradley Morgenfeld, Jujin An, Meng Luo, Haoren Zhuang
Proceedings Volume 7974, 79740E (2011) https://doi.org/10.1117/12.879681
KEYWORDS: Optical proximity correction, Etching, Silicon, Double patterning technology, Oxides, Photomasks, Lithography, Logic, Printing, Semiconducting wafers

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78233U (2010) https://doi.org/10.1117/12.865134
KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Silicon, Data modeling, Photomasks, Calibration, Printing, Reflectivity, Photoresist processing

Showing 5 of 7 publications
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