Mr. Chansam Chang Profile

Chansam Chang

application engineer consultant

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Publications (7)

Proceedings Article | 24 March 2017 Presentation + Paper

Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity

Bram van Hoof, Arjan Holscher, Ralf Gommers, Jeroen Cottaar, Marcel Raas, Samah Khalek, Jan van Kemenade, Maarten Voncken, Roelof de Graaf, Elliot Oti, Stefan Weichselbaum, Richard Droste, ByeongSoo Lee, Chansam Chang, Young Seog Kang, Young Ha Kim, Jeong-Heung Kong, Jong Hoon Jang, YoungSun Nam, Hyunwoo Hwang

Proceedings Volume 10147, 101471A (2017) https://doi.org/10.1117/12.2259794

KEYWORDS: Semiconducting wafers, Sensors, Time metrology, Scanners, Optical alignment, Calibration, Wafer testing, Overlay metrology, Metrology, Computer programming

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Proceedings Article | 15 March 2016 Paper

Improvement of unbalanced illumination induced telecentricity within the exposure slit

Jonghoon Jang, ByeongSoo Lee, Young Seog Kang, Chansam Chang, Jeong-Heung Kong, Young Ha Kim, Wim Bouman, Roelof de Graaf, Stefan Weichselbaum, Richard Droste, Wim de Boeij, Bart van Bussel, Patrick Neefs, Arij Rijke

Proceedings Volume 9780, 97800X (2016) https://doi.org/10.1117/12.2220588

KEYWORDS: Lithography, Lithographic illumination, Optical alignment, Scanners, Optical lithography, Image enhancement, Reticles, Electronics

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Proceedings Article | 16 April 2011 Paper

Critical challenges for non-critical layers

J. M. Gomez, I. Popova, B. Zhang, H. Kry, S. Holmes, S. Nakagawa, T. Murakami, Chan Sam Chang, Cheol Kim

Proceedings Volume 7972, 79722T (2011) https://doi.org/10.1117/12.879866

KEYWORDS: Photoresist processing, Lithography, Germanium, Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Reflectivity, Etching, Scanners

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Proceedings Article | 4 April 2011 Paper

Single exposure contacts are dead. Long live single exposure contacts!

Henning Haffner, Martin Ostermayr, Hideki Kanai, Chan Sam Chang, Bradley Morgenfeld, Jujin An, Meng Luo, Haoren Zhuang

Proceedings Volume 7974, 79740E (2011) https://doi.org/10.1117/12.879681

KEYWORDS: Optical proximity correction, Etching, Silicon, Double patterning technology, Oxides, Photomasks, Lithography, Logic, Printing, Semiconducting wafers

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Proceedings Article | 25 September 2010 Paper

Substrate aware OPC rules for edge effect in block levels

Dongbing Shao, Todd Bailey, Ian Stobert, Irene Popova, Chan Sam Chang

Proceedings Volume 7823, 78233U (2010) https://doi.org/10.1117/12.865134

KEYWORDS: Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Silicon, Data modeling, Photomasks, Calibration, Printing, Reflectivity, Photoresist processing

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Proceedings Article | 31 March 2010 Paper

Noble design of Si-SOH in trilayer resist process for sub-30-nm logic device

Tae-Hwan Oh, Yunsuk Nam, Chansam Chang, Suhyun Kim, Minkeun Kwak, Dongsu Kim, Hongjae Shin, Nae-In Lee, Jongshik Yoon

Proceedings Volume 7639, 763927 (2010) https://doi.org/10.1117/12.846478

KEYWORDS: Photoresist processing, Silicon, Lithography, Critical dimension metrology, Immersion lithography, Silicon carbide, Carbon, Logic devices, Control systems, Photomasks

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Proceedings Article | 19 May 2009 Paper

Modified trilayer resist approach for ArF immersion lithography

Tae-Hwan Oh, Yunsuk Nam, Suhyun Kim, Minkeun Kwak, Hyungsam Choi, Chansam Chang, Yongchul Kim, Hong-Jae Shin, Nae-In Lee

Proceedings Volume 7273, 727314 (2009) https://doi.org/10.1117/12.814013

KEYWORDS: Head-mounted displays, Silicon, Photoresist processing, Coating, Lithography, Immersion lithography, Semiconducting wafers, Advanced distributed simulations, Carbon, Silicon carbide

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Showing 5 of 7 publications

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