Dr. Chansam Chang
Senior Engineer at
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Metrology, Sensors, Calibration, Scanners, Computer programming, Time metrology, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Reticles, Electronics, Optical lithography, Lithographic illumination, Scanners, Image enhancement, Optical alignment

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Etching, Scanners, Germanium, Reflectivity, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | April 4, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Oxides, Lithography, Logic, Etching, Silicon, Printing, Photomasks, Double patterning technology, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Data modeling, Calibration, Silicon, Reflectivity, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Carbon, Lithography, Silicon, Control systems, Photomasks, Immersion lithography, Logic devices, Silicon carbide, Critical dimension metrology, Photoresist processing

Showing 5 of 7 publications
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