Molecular-ruler nanolithography uses individual molecules as building blocks to create nanometer-scale features in a
low-cost, high-throughput process. Self-assembled multilayers are used in combination with radiation-sensitive
polymeric resists to interface nanometer-scale features with structures fabricated using conventional lithographic
methods. This technique is advantageous for its high precision, parallel processing, and low capital investment. Here,
we provide an overview of molecular-ruler nanolithography and describe how this technology is being applied to the
creation of nanometer-scale devices, patterning of large-area sub-200-nm grating structures, and the fabrication of
quartz templates for use as molds in imprint lithography.