Dr. Charles N. Archie
Metrology Consultant
SPIE Involvement:
Author | Instructor
Publications (43)

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Scanning electron microscopy, Metrology, Data modeling, Optical proximity correction, Critical dimension metrology, Photoresist materials, Scanners, Process modeling, 3D modeling, Optical lithography

SPIE Journal Paper | 19 December 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Error analysis, Semiconducting wafers, Scatterometry, Semiconductors, Statistical modeling, Calibration, Measurement devices

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Critical dimension metrology, Calibration, Metrology, Deconvolution, Statistical analysis, Cadmium, Standards development, Semiconducting wafers, Data analysis, 3D metrology

Showing 5 of 43 publications
Proceedings Volume Editor (4)

Conference Committee Involvement (9)
Metrology, Inspection, and Process Control for Microlithography XXV
28 February 2011 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIV
22 February 2010 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIII
23 February 2009 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Showing 5 of 9 Conference Committees
Course Instructor
SC705: Instruments and Methodologies for Accurate Metrology and Fleet Matching
This course teaches the methodologies of total measurement uncertainty (TMU) analysis and fleet measurement precision (FMP) analysis. The course concentrates on the application of a general form of regression analysis (Mandel) to the applications of measurement tool matching, and measurement instrument assessment and optimization. Case studies will be selected from a collection of examples from measurement technologies such as CD-SEM, scatterometer, overlay, and CD-AFM. These examples will provide the seminar participants with the knowledge and tools necessary for conducting single tool and multiple tool assessments and optimizations.
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