Dr. Charles N. Archie
Metrology Consultant
SPIE Involvement:
Conference Program Committee | Conference Chair | Conference Co-Chair | Author | Instructor
Publications (47)

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Optical lithography, Data modeling, Scanners, 3D modeling, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Critical dimension metrology, Process modeling

SPIE Journal Paper | 19 December 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Transmission electron microscopy, Statistical analysis, Semiconducting wafers, Error analysis, Manufacturing, Scatterometry, Semiconductors, Uncertainty analysis, Quality measurement

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Metrology, Statistical analysis, Calibration, Error analysis, Transmission electron microscopy, Scatterometry, Measurement devices, Semiconducting wafers, Statistical modeling

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Metrology, Scatterometry, Critical dimension metrology, Semiconducting wafers, Data modeling, Atomic force microscopy, Transmission electron microscopy, Inspection, 3D metrology

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Statistical analysis, Cadmium, Calibration, 3D metrology, Deconvolution, Critical dimension metrology, Semiconducting wafers, Standards development, Data analysis

Showing 5 of 47 publications
Conference Committee Involvement (9)
Metrology, Inspection, and Process Control for Microlithography XXV
28 February 2011 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIV
22 February 2010 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXIII
23 February 2009 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXII
25 February 2008 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXI
26 February 2007 | San Jose, California, United States
Showing 5 of 9 Conference Committees
Course Instructor
SC705: Instruments and Methodologies for Accurate Metrology and Fleet Matching
This course teaches the methodologies of total measurement uncertainty (TMU) analysis and fleet measurement precision (FMP) analysis. The course concentrates on the application of a general form of regression analysis (Mandel) to the applications of measurement tool matching, and measurement instrument assessment and optimization. Case studies will be selected from a collection of examples from measurement technologies such as CD-SEM, scatterometer, overlay, and CD-AFM. These examples will provide the seminar participants with the knowledge and tools necessary for conducting single tool and multiple tool assessments and optimizations.
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