Dr. Charles T. Black Profile

Dr. Charles T. Black

Scientist at Brookhaven National Lab

SPIE Involvement:

Author

Proceedings Article | 17 September 2016 Paper

Plasmonic transparent conductors

Andreas Liapis, Matthew Sfeir, Charles Black

Proceedings Volume 9921, 992138 (2016) https://doi.org/10.1117/12.2238469

KEYWORDS: Plasmonics, Metals, Transmittance, Transparent conductors, Surface plasmons, Silver, Glasses, Nanostructuring, Resistance, Interfaces

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Proceedings Article | 4 June 2014 Paper

Block copolymer self assembly for design and vapor phase synthesis of one-dimensional nanostructured materials

A Rahman, C. Black

Proceedings Volume 9083, 90831Y (2014) https://doi.org/10.1117/12.2050775

KEYWORDS: Germanium, Thin films, Silicon, Reflectivity, Nanostructures, Metals, Polymers, Polymethylmethacrylate, Nanostructuring, Nanowires

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SPIE Journal Paper | 24 July 2012

Plasma etch transfer of self-assembled polymer patterns

Danvers Johnston, Ming Lu, Charles Black

JM3, Vol. 11, Issue 3, 031306, (July 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031306

KEYWORDS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Polymethylmethacrylate, Scanning electron microscopy, Thin films, Reactive ion etching

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Proceedings Article | 17 March 2012 Paper

Plasma etch transfer of self-assembled polymer patterns

Danvers Johnston, Ming Lu, Charles Black

Proceedings Volume 8328, 83280A (2012) https://doi.org/10.1117/12.920311

KEYWORDS: Etching, Plasma etching, Polymers, Plasma, Optical lithography, Silicon, Thin films, Polymethylmethacrylate, Oxygen, Image processing

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SPIE Journal Paper | 14 March 2012

Implementing nanometer-scale confinement in organic semiconductor bulk heterojunction solar cells

Jonathan Allen, Kevin Yager, Chang-Yong Nam, Charles Black, Htay Hlaing, Benjamin Ocko

JPE, Vol. 2, Issue 1, 021008, (March 2012) https://doi.org/10.1117/12.10.1117/1.JPE.2.021008

KEYWORDS: Solar cells, Heterojunctions, Organic semiconductors, Annealing, Aluminum, Scattering, Organic photovoltaics, Polymethylmethacrylate, Scanning electron microscopy, Etching

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Proceedings Article | 20 March 2008 Paper

Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid

Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Ricardo Ruiz, Charles Black, Jed Pitera, Charles Rettner, Myron Flickner

Proceedings Volume 6921, 692129 (2008) https://doi.org/10.1117/12.772684

KEYWORDS: Photomicroscopy, Scanning electron microscopy, Silicon, Plasma etching, Picosecond phenomena, Coating, Oxides, Chromium, Lithography, Directed self assembly

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Proceedings Article | 13 March 2006 Paper

Self assembly in semiconductor microelectronics: self-aligned sub-lithographic patterning using diblock copolymer thin films

C. T. Black, R. Ruiz

Proceedings Volume 6153, 615302 (2006) https://doi.org/10.1117/12.659252

KEYWORDS: Polymethylmethacrylate, Polymers, Lithography, Optical lithography, Picosecond phenomena, Semiconductors, Scanning electron microscopy, Thin films, Chemical elements, Image processing

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Proceedings Article | 12 June 2003 Paper

Does line-edge roughness matter?: FEOL and BEOL perspectives

Qinghuang Lin, Charles Black, Christophe Detavernier, Lynne Gignac, Kathryn Guarini, Brian Herbst, Hyungjun Kim, Philip Oldiges, Karen Petrillo, Martha Sanchez

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487736

KEYWORDS: Line edge roughness, Copper, Transistors, Atomic layer deposition, Silicon, Back end of line, Surface roughness, Tantalum, Front end of line, Plasma

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Proceedings Article | 1 May 1997 Paper

Demonstration of a nanolithographic system using a self-assembled monolayer resist for neutral atomic cesium

Rebecca Younkin, Karl Berggren, Eunice Cheung, Kent Johnson, Mara Goff Prentiss, Andrew Black, George Whitesides, D. Ralph, Charles Black, Michael Tinkham

Proceedings Volume 2995, (1997) https://doi.org/10.1117/12.273747

KEYWORDS: Cesium, Self-assembled monolayers, Gold, Silicon, Chemical species, Etching, Photomasks, Silica, Lithography, Optical lithography

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Proceedings Article | 1 May 1997 Paper

Using neutral metastable argon atoms and contamination lithography to form nanostructures in silicon, silicon dioxide, and gold

Kent Johnson, Karl Berggren, Andrew Black, Charles Black, Arthur Chu, Nynke Dekker, D. Ralph, Joseph Thywissen, Rebecca Younkin, Mara Goff Prentiss, Michael Tinkham, George Whitesides

Proceedings Volume 2995, (1997) https://doi.org/10.1117/12.273746

KEYWORDS: Chemical species, Silicon, Gold, Argon, Lithography, Silica, Photomasks, Etching, Photoresist processing, Wet etching

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Showing 5 of 10 publications

Conference Committee Involvement (1)

Advanced Etch Technology for Nanopatterning III

24 February 2014 | San Jose, California, United States

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