Dr. Charles R. Chambers
Technical Supervisor at DuPont Electronic Polymers
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Author
Publications (9)

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Polymers, Photoresist materials, Microelectronics, Polymerization, Photomasks, Line width roughness, Directed self assembly, Photoresist developing

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Refractive index, Microfluidics, Polymers, Water, Photoresist materials, Refraction, Immersion lithography, Sodium, Chlorine, Systems modeling

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Water, Silicon, Photoresist materials, Refraction, Spectroscopic ellipsometry, Scintillation, Immersion lithography, Semiconducting wafers, Liquids

Proceedings Article | 14 May 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Transparency, Optical lithography, Polymers, Glasses, Scanning electron microscopy, Photoresist materials, Absorbance, Semiconducting wafers, Distributed interactive simulations, Picture Archiving and Communication System

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Optical lithography, Polymers, Carbonates, Photoresist materials, Absorbance, Fluorine, Semiconducting wafers, Carbon monoxide, Distributed interactive simulations

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Optical lithography, Imaging systems, Etching, Polymers, Chemistry, Resistance, Absorbance, Carbon monoxide

Showing 5 of 9 publications
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