Dr. Charles W. Gwyn
Program Director at EUV LLC
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Multilayers, Reticles, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Point spread functions, Reticles, Image resolution, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Mirrors, Reticles, Interferometry, Wavefronts, Printing, Extreme ultraviolet, Modulation transfer functions, Critical dimension metrology, Fiber optic illuminators

Proceedings Article | 20 December 2001
Proc. SPIE. 4506, Soft X-Ray and EUV Imaging Systems II
KEYWORDS: Lithography, Monochromatic aberrations, Mirrors, Reticles, Sensors, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Plasma

Proceedings Article | 20 August 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Mirrors, Multilayers, Reticles, Sensors, Xenon, Projection systems, Extreme ultraviolet, Optical alignment, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 22 January 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Multilayers, Optical lithography, Defect detection, Coating, Inspection, Ion beams, Photomasks, Extreme ultraviolet lithography, Process modeling

Showing 5 of 6 publications
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