Dr. Charles J. Neef
Scientist at Brewer Science Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Etching, Silicon, Chemistry, Photoresist materials, Silicon films, Epoxies, Silicon carbide, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Carbon, Lithography, Titanium, Etching, Crystals, Silicon, Chemistry, Photoresist materials, Semiconducting wafers, Temperature metrology

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Multilayers, Etching, Silicon, Reflectivity, Photomasks, Plasma etching, Semiconducting wafers, System on a chip, Plasma

PROCEEDINGS ARTICLE | March 30, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Argon, Silicon, Reflectivity, Chromophores, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Photoresist developing, Temperature metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Image processing, Coating, Materials processing, Scanning electron microscopy, Photoresist materials, Plasma etching, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Resistance, Reflectivity, Photoresist materials, Semiconducting wafers, Photoresist developing, Bottom antireflective coatings

Showing 5 of 8 publications
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