Dr. Charles M. Settens
Graduate Research Assistant at Massachusetts Institute of Technology
SPIE Involvement:
Author
Area of Expertise:
X-ray Metrology , SAXS , XRD , Small angle X-ray Scattering , XRR , FinFET
Profile Summary

My PhD research centers on metrology of nanostructures from various semiconductor materials with X-ray probes, particularly small angle X-ray scattering (SAXS), high resolution X-ray diffractometry (HRXRD) and reflectometry (XRR), as well as supplemental characterization techniques such as, atomic force microscopy (AFM), scanning electron microscopy (SEM) and transmission electron microscopy (TEM).
Publications (4)

SPIE Journal Paper | November 4, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Silicon, Scattering, X-rays, Hydrogen, Critical dimension metrology, Annealing, Metrology, Scatter measurement, Double patterning technology

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Oxides, Metrology, Etching, Silicon, Image resolution, Scanning electron microscopy, Scanning helium ion microscopy, 3D metrology, Critical dimension metrology

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Oxides, Metrology, Scattering, Etching, X-rays, Silicon, 3D metrology, Critical dimension metrology, Scatter measurement

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Thin films, Lithography, Polymers, Interfaces, Silicon, Silicon films, Extreme ultraviolet, Extreme ultraviolet lithography, Head-mounted displays, Line edge roughness

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