Dr. Charles M. Settens
Graduate Research Assistant at Massachusetts Institute of Technology
SPIE Involvement:
Author
Area of Expertise:
X-ray Metrology , SAXS , XRD , Small angle X-ray Scattering , XRR , FinFET
Profile Summary

My PhD research centers on metrology of nanostructures from various semiconductor materials with X-ray probes, particularly small angle X-ray scattering (SAXS), high resolution X-ray diffractometry (HRXRD) and reflectometry (XRR), as well as supplemental characterization techniques such as, atomic force microscopy (AFM), scanning electron microscopy (SEM) and transmission electron microscopy (TEM).
Publications (4)

SPIE Journal Paper | 4 November 2014
Charles Settens, Aaron Cordes, Benjamin Bunday, Abner Bello, Vimal Kamineni, Abhijeet Paul, Jody Fronheiser, Richard Matyi
JM3, Vol. 13, Issue 04, 041408, (November 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041408
KEYWORDS: Silicon, Scattering, X-rays, Hydrogen, Critical dimension metrology, Annealing, Metrology, Scatter measurement, Double patterning technology

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86810L (2013) https://doi.org/10.1117/12.2012019
KEYWORDS: Scattering, 3D metrology, Critical dimension metrology, X-rays, Etching, Silicon, Metrology, Oxides, Scatter measurement

Proceedings Article | 10 April 2013 Paper
Proceedings Volume 8681, 86813B (2013) https://doi.org/10.1117/12.2012472
KEYWORDS: Critical dimension metrology, Metrology, Scanning helium ion microscopy, 3D metrology, Silicon, Image resolution, Etching, Scanning electron microscopy, Oxides

Proceedings Article | 16 April 2011 Paper
Craig Higgins, Charles Settens, Patricia Wolfe, Karen Petrillo, Robert Auger, Richard Matyi, Robert Brainard
Proceedings Volume 7972, 797211 (2011) https://doi.org/10.1117/12.879509
KEYWORDS: Line edge roughness, Silicon, Polymers, Lithography, Extreme ultraviolet, Head-mounted displays, Silicon films, Thin films, Extreme ultraviolet lithography, Interfaces

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