Dr. Charles R. Szmanda
Patent Agent at patent-practicecom
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Antireflective coatings, Optical lithography, Image processing, Ultraviolet radiation, Fourier transforms, Photoresist materials, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 1 April 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Superposition, Lithography, Refractive index, Optical properties, Computer simulations, Nonlinear optics, Photomasks, Double patterning technology, Photoresist processing, Semiconducting wafers

Proceedings Article | 28 March 2008 Paper
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Photons, X-rays, Quantum efficiency, Coating, Photoresist materials, Reflectometry, Extreme ultraviolet, Absorbance, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 22 March 2007 Paper
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Data modeling, Etching, Chemical species, Polymers, Error analysis, Resistance, Photoresist materials, Statistical modeling, Photoresist developing

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Silicon, Resistance, Reflectivity, Absorbance, Plasma etching, Absorption

Showing 5 of 16 publications
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