Dr. Charles R. Szmanda
Patent Agent at patent-practicecom
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Photoresist processing, Semiconducting wafers, Double patterning technology, Ultraviolet radiation, Photoresist materials, Image processing, Optical lithography, Lithography, Fourier transforms, Antireflective coatings

Proceedings Article | 1 April 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Semiconducting wafers, Lithography, Refractive index, Double patterning technology, Photomasks, Computer simulations, Optical properties, Photoresist processing, Nonlinear optics, Superposition

Proceedings Article | 28 March 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Etching, Polymers, Photoresist materials, Resistance, Chemical species, Lithography, Error analysis, Photoresist developing, Data modeling, Statistical modeling

Proceedings Article | 24 July 2002
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Absorbance, Polymers, Lithography, Silicon, Etching, Absorption, Plasma etching, Resistance, Reflectivity, Optical lithography

Showing 5 of 16 publications
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