Dr. Charles Tarrio
Physicist at National Institute of Standards and Technology
SPIE Involvement:
Conference Program Committee | Author
Publications (38)

Proceedings Article | 16 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Oxides, Multilayers, Annealing, Silicon, Resistance, Reflectivity, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

Proceedings Article | 13 March 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Electron beams, Contamination, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Semiconducting wafers, Standards development, Temperature metrology

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Data modeling, Polarization, Sensors, Reflectivity, 3D modeling, Reflectometry, Extreme ultraviolet, Radiation effects, Motion models, EUV optics

Proceedings Article | 18 March 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Nickel, Reflectivity, Infrared radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Infrared technology, Neodymium, Surface finishing, Plasma, Diffraction gratings

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Molecules, Manufacturing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Mirrors, Contamination, Photons, Electrons, Photoresist materials, Extreme ultraviolet, Beam shaping, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Showing 5 of 38 publications
Conference Committee Involvement (1)
Optical Constants of Materials for UV to X-Ray Wavelengths
4 August 2004 | Denver, Colorado, United States
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