Dr. Charles M. Wynn Profile

Dr. Charles M. Wynn

Technical Staff at MIT Lincoln Lab

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 21 April 2020 Presentation + Paper

Computational reconfigurable imaging spectrometer (CRISP)

C. Wynn, Y. Rachlin, A. Milstein, J. Lessard, S. Kaushik, R. Sullenberger

Proceedings Volume 11396, 1139607 (2020) https://doi.org/10.1117/12.2552937

KEYWORDS: Spectroscopy, Imaging systems, Point spread functions, Microbolometers, Aluminum, FT-IR spectroscopy, Long wavelength infrared, Signal to noise ratio, Sensors, Staring arrays

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SPIE Journal Paper | 8 December 2018 Open Access

Characterization of laser ultrasound source signals in biological tissues for imaging applications

Jonathan Fincke, Charles Wynn, Rob Haupt, Xiang Zhang, Diego Rivera, Brian Anthony

JBO, Vol. 24, Issue 02, 021206, (December 2018) https://doi.org/10.1117/12.10.1117/1.JBO.24.2.021206

KEYWORDS: Tissues, Acoustics, Tissue optics, Transducers, Ultrasonography, Signal attenuation, Imaging systems, Biomedical optics, Natural surfaces, Absorption

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SPIE Journal Paper | 28 August 2013 Open Access

High-sensitivity detection of trace gases using dynamic photoacoustic spectroscopy

Charles Wynn, Stephen Palmacci, Michelle Clark, Roderick Kunz

OE, Vol. 53, Issue 02, 021103, (August 2013) https://doi.org/10.1117/12.10.1117/1.OE.53.2.021103

KEYWORDS: Photoacoustic spectroscopy, Signal detection, Acoustics, Signal to noise ratio, Gases, Absorption, Solids, Environmental sensing, Receivers, Gas lasers

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Proceedings Article | 17 April 2008 Paper

Experimental demonstration of remote optical detection of trace explosives

C. Wynn, S. Palmacci, R. Kunz, J. Zayhowski, B. Edwards, M. Rothschild

Proceedings Volume 6954, 695407 (2008) https://doi.org/10.1117/12.782371

KEYWORDS: Explosives, Luminescence, Photons, Solids, Liquids, Signal detection, Explosives detection, Optical filters, Optical parametric oscillators, Quantum efficiency

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Proceedings Article | 1 April 2008 Paper

Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography

Jeffrey Knecht, Vladimir Bolkhovsky, Jay Sage, Brian Tyrrell, Bruce Wheeler, Charles Wynn

Proceedings Volume 6924, 69244R (2008) https://doi.org/10.1117/12.777133

KEYWORDS: Charge-coupled devices, Photomasks, Phase shifts, Signal processing, Lithography, Etching, CMOS technology, Critical dimension metrology, Double patterning technology, Photoresist materials

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