Dr. Charlie Q. Zhang
at Synopsys Inc
SPIE Involvement:
Author
Publications (25)

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Data modeling, Physics, Photoresist materials, Optical proximity correction, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Photoresist developing, Reverse modeling

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Atrial fibrillation, Manufacturing, 3D modeling, Printing, Solids, Photomasks, Cadmium sulfide, Optical proximity correction, Critical dimension metrology, Model-based design

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Photoresist developing, Process modeling

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Data modeling, Calibration, Metals, Finite element methods, Optical proximity correction, Semiconducting wafers, Performance modeling, Process modeling

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Chromatic aberrations, Lithography, Optical lithography, Calibration, Scanners, Laser development, Laser scanners, Optical proximity correction, 3D scanning, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Thin films, Lithography, Apodization, Reticles, Data modeling, Polarization, Scanners, Pellicles, Photomasks, Optical proximity correction

Showing 5 of 25 publications
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