Dr. Charlotte A. Cutler
Principle Process Engineer
SPIE Involvement:
Publications (11)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12957, 1295711 (2024) https://doi.org/10.1117/12.3010447
KEYWORDS: Extreme ultraviolet, Printing, Lithography, Optical lithography, Integrated circuits, Film thickness, Extreme ultraviolet lithography, Etching, Double patterning technology, Chemistry

SPIE Journal Paper | 28 January 2021 Open Access
Charlotte Cutler, James Thackeray, Peter Trefonas, Dan Millward, Choong Bong Lee, Chris Mack
JM3, Vol. 20, Issue 01, 010901, (January 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.1.010901
KEYWORDS: Line width roughness, Nanoimprint lithography, Diffusion, Etching, Diffractive optical elements, Photoresist processing, Image analysis, Image processing, Semiconducting wafers, Photoresist materials

Proceedings Article | 24 March 2020 Presentation
Charlotte Cutler, Dan Millward, Choong-Bong Lee, James Thackeray, John Nelson, Jason DeSisto, Rochelle Rena, Chris Mack
Proceedings Volume 11326, 113260H (2020) https://doi.org/10.1117/12.2551694

Proceedings Article | 25 March 2019 Presentation + Paper
Proceedings Volume 10960, 109600I (2019) https://doi.org/10.1117/12.2515073
KEYWORDS: Line width roughness, Nanoimprint lithography, Diffusion, Diffractive optical elements, Image processing, Photoresist processing, Temperature metrology, Image analysis, Image resolution, Lithography

Proceedings Article | 23 March 2018 Presentation + Paper
Proceedings Volume 10587, 1058707 (2018) https://doi.org/10.1117/12.2297690
KEYWORDS: Line width roughness, Scanning electron microscopy

Showing 5 of 11 publications
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