Dr. Charlotte A. Cutler
Research Scientist at Dow Electronic Materials
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Scanning electron microscopy, Line width roughness

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Etching, Dry etching, Polymers, Reflectivity, Ion implantation

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Cadmium, Materials processing, Scanning electron microscopy, Printing, Photoresist materials, Line width roughness, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Photoresist developing, 193nm lithography

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Etching, Dry etching, Polymers, Metals, Silicon, Reflectivity, Chemical vapor deposition, Oxygen, Photoresist materials, Photomasks

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Semiconductors, Magnesium, Statistical analysis, Polymers, Hydrogen, Materials processing, Photoresist materials, Optimization (mathematics), Photoresist developing, Process modeling

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Optical spheres, Deep ultraviolet, Photons, Molecules, Diffusion, Quantum efficiency, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 7 publications
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