CHARU SARDANA
SR. MTS at Intel Corporation
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | August 12, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Electron beam direct write lithography, Photovoltaics, Lithium, Immersion lithography, Electron beam lithography, Lithography, Electronic design automation, Field programmable gate arrays, Metals, Optical proximity correction

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Electron beam direct write lithography, Photovoltaics, Electron beam lithography, Lithography, Photomasks, Metals, Critical dimension metrology, Electronic design automation, Optical proximity correction, Field programmable gate arrays

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