Dr. Chawon Koh
Project Manager at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Thin films, Lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Thin films, Contamination, Data modeling, Calibration, Etching, Coating, Scanning electron microscopy, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Semiconductors, Electronics, Optical lithography, Etching, Inspection, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | April 7, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Deep ultraviolet, Reflectivity, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Resolution enhancement technologies, Plasma

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithographic illumination, Image resolution, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Mask cleaning, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Scanners, Inspection, Electroluminescence, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 23 publications
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