Dr. Chen-Rui Tseng
Manager at Taiwan Mask Corp
SPIE Involvement:
Publications (4)

Proceedings Article | 17 April 2012 Paper
Ming-Chih Chen, Hsiang-Jen Yang, Chen-Rui Tseng
Proceedings Volume 8352, 83520T (2012) https://doi.org/10.1117/12.921280
KEYWORDS: SRAF, Chromium, Cavitation, Oxides, Photomasks, Particles, Binary data, Inspection, Atomic force microscopy, Extreme ultraviolet

Proceedings Article | 30 October 2007 Paper
Jyh Wei Hsu, David Lee, Chen Rui Tseng, Eric Hong, Chun Hung Wu
Proceedings Volume 6730, 67300I (2007) https://doi.org/10.1117/12.746654
KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Dry etching, Etching, Printing, Photoresist processing, Diffusion, Deep ultraviolet, Metrology

Proceedings Article | 20 October 2006 Paper
Chen-Rui Tseng, Kevin Cheng, David Lee, Sheng-Bay Yang, Chun-Hung Wu
Proceedings Volume 6349, 63494C (2006) https://doi.org/10.1117/12.686377
KEYWORDS: Optical proximity correction, Photomasks, Electron beam melting, Resolution enhancement technologies, Electron beam lithography, Critical dimension metrology, Mask making, Beam shaping, Standards development

Proceedings Article | 21 June 2006 Paper
Chen-Rui Tseng, Eng-Ann Gan, David Lee, Chun-Hung Wu, Shiuh-Bin Chen
Proceedings Volume 6281, 62810L (2006) https://doi.org/10.1117/12.692646
KEYWORDS: Photomasks, Critical dimension metrology, Photoresist processing, Chemically amplified resists, Electron beam lithography, Mask making, Chemical analysis, Catalysis, Scanning electron microscopy, Photomicroscopy

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