Dr. Chen-Rui Tseng
Manager at Taiwan Mask Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 17, 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Oxides, Particles, Inspection, Chromium, Atomic force microscopy, Photomasks, Extreme ultraviolet, SRAF, Cavitation, Binary data

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Metrology, Deep ultraviolet, Etching, Dry etching, Diffusion, Chromium, Printing, Photomasks, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beam lithography, Photomasks, Beam shaping, Optical proximity correction, Electron beam melting, Mask making, Critical dimension metrology, Standards development, Resolution enhancement technologies

PROCEEDINGS ARTICLE | June 21, 2006
Proc. SPIE. 6281, 22nd European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Scanning electron microscopy, Photomasks, Chemical analysis, Mask making, Critical dimension metrology, Photomicroscopy, Photoresist processing, Catalysis, Chemically amplified resists

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