Chenchun Shi
at Xiamen Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 6 February 2019
Proc. SPIE. 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology
KEYWORDS: Polishing, Data modeling, Abrasives, Surface finishing, Particles, Interfaces, Performance modeling, Kinematics

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