Cheng-He Li
at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Logic, Optical lithography, Databases, Metals, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Manufacturing, Design for manufacturing, Optical proximity correction, Model-based design, Process modeling, Design for manufacturability

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Image compression, Optical properties, Visualization, Distortion, Integrated optics, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Model-based design, Design for manufacturability

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Logic, Lithographic illumination, Metals, Scanners, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Phase shifts

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