Mr. ChengCheng Kuo
Principle Engineer at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Optical lithography, Lithographic illumination, Detection and tracking algorithms, Image segmentation, Photomasks, Semiconductor manufacturing, Immersion lithography, Optical proximity correction, Neodymium, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Wafer-level optics, Lithography, Genetic algorithms, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top