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ChenKu Chiang
Product Manager, PHOTO POU at ENTEGRIS
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Publications (1)
Proceedings Article | 22 March 2006 Paper
Contact-hole process window improved by assistant features with FLEX function on KrF
Cheng Ku Chiang, L. Yeh, Wen Bin Wu, Chiang Lin Shih, Jeng Ping Lin
Proceedings Volume 6154, 61542G (2006) https://doi.org/10.1117/12.656317
KEYWORDS: Optical proximity correction, Resolution enhancement technologies, SRAF, Lithography, Optical lithography, Lithographic illumination, 193nm lithography, Semiconductors, Semiconducting wafers, Reticles
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