Cheolkyu Bok
Research Fellow at SK Hynix Inc
SPIE Involvement:
Author
Publications (58)

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Logic, Optical lithography, Ultraviolet radiation, Particles, Coating, Manufacturing, High volume manufacturing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Defect inspection

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Optical lithography, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Absorption

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Edge roughness

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Image processing, Scanners, Chromium, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist developing

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Resistance, Electroluminescence, Photomasks, Image enhancement, Photoresist processing, Semiconducting wafers

Showing 5 of 58 publications
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