Cheolkyu Bok
Research Fellow at SK Hynix Inc
SPIE Involvement:
Author
Publications (58)

PROCEEDINGS ARTICLE | March 21, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Logic, Optical lithography, Ultraviolet radiation, Particles, Coating, Manufacturing, High volume manufacturing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Optical lithography, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Metrology, Optical lithography, Etching, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Critical dimension metrology, Edge roughness

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Optical lithography, Etching, Image processing, Scanners, Chromium, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist developing

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Resistance, Electroluminescence, Photomasks, Image enhancement, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Data modeling, Calibration, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes

Showing 5 of 58 publications
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