Mr. Cheolkyun Kim
Principal Engineer
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 16, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Visualization, Databases, Etching, Metals, Manufacturing, Design for manufacturing, Shape analysis, Logic devices, Critical dimension metrology, Design for manufacturability

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Antireflective coatings, Optical lithography, Data modeling, Visualization, Reflection, Dry etching, Image processing, Scanning electron microscopy, Buildings, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Data modeling, Calibration, Etching, 3D modeling, Scanning electron microscopy, Wafer inspection, Virtual reality, Semiconducting wafers, Process modeling, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Logic, Metals, Logic devices, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Shape memory alloys, Instrument modeling

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Reticles, Lithographic illumination, Image processing, Scanning electron microscopy, Optical proximity correction, Photoresist processing, Semiconducting wafers, Standards development, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 29, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Point spread functions, Data modeling, Calibration, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Stochastic processes

Showing 5 of 24 publications
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