Cherry Tang
Senior R&D Manager - Lithography at JSR Micro Inc.
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Author
Publications (14)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Chromophores, Silicon films, Solids, Critical dimension metrology, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Polymers, Silicon, Reflectivity, Photoresist materials, Photomasks, Picosecond phenomena, Critical dimension metrology, Semiconducting wafers, Photoresist developing

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Optical lithography, Etching, Dielectrics, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Polishing, Optical lithography, Etching, Copper, Dielectrics, Photoresist materials, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Semiconductors, Lithography, Particles, Silicon, Scanning electron microscopy, Photomasks, Double patterning technology, Reactive ion etching, Photoresist processing, Semiconducting wafers

Showing 5 of 14 publications
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