Cheryl Alix
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 24 March 2020
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Fin field effect transistors, Etching, Gallium arsenide, Silicon, Line width roughness, Transistors, Field effect transistors, Critical dimension metrology, Line edge roughness, Plasma

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Nanostructures, Diffraction, Metrology, Data modeling, Scattering, Etching, X-rays, Field effect transistors, Critical dimension metrology, X-ray characterization

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