In-line characterization of non-selective SiGe nodule defects with scatterometry enabled by machine learning (Conference Presentation)
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?
Directed self assembly on resist-limited guiding patterns for hole grapho-epitaxy: Can DSA help lower EUV's source power requirements?
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning