Chi-Hong Tung
at Industrial Technology Research Institute
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | September 21, 2007
Proc. SPIE. 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
KEYWORDS: Diffraction, Beam splitters, Interferometers, Error analysis, Reliability, Interferometry, Phase interferometry, Profiling, 3D metrology, Phase shifts

PROCEEDINGS ARTICLE | September 11, 2007
Proc. SPIE. 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
KEYWORDS: Actuators, Beam splitters, Light sources, Interferometers, Calibration, Image processing, Interferometry, LCDs, 3D metrology, Charge-coupled devices

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Reticles, Data modeling, Calibration, Error analysis, Process control, Semiconducting wafers, Tolerancing, Wafer testing, Overlay metrology

PROCEEDINGS ARTICLE | August 14, 2006
Proc. SPIE. 6292, Interferometry XIII: Techniques and Analysis
KEYWORDS: Optical filters, Mirrors, Beam splitters, Light sources, Error analysis, Interferometry, Time metrology, Profiling, Objectives, Charge-coupled devices

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Data modeling, Image processing, Image acquisition, Image resolution, Scanning electron microscopy, Process control, Semiconducting wafers, Tolerancing, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Optical design, Scattering, Light scattering, Laser scattering, Interference (communication), Scatterometry, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Overlay metrology

Showing 5 of 9 publications
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