Chi-Hung Wang
at Shanghai Huali Integrated Circuit Corp.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Transmission electron microscopy, Calibration, Semiconducting wafers, Electron microscopes, Fin field effect transistors, Image filtering, Scanning electron microscopy, Etching, Image quality, Integrated circuits, Deep ultraviolet, 193nm lithography, Electro optical systems calibration, Precision measurement, Accuracy assessment

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