Dr. Chi-Ming Tsai
Deputy Director at TSMC
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Data modeling, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Integrated circuit design, Optics manufacturing, Resolution enhancement technologies, Design for manufacturability

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Databases, Manufacturing, Computer simulations, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Binary data, Model-based design

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