Mr. Chi-Yuan Hung
Manager at Semiconductor Manufacturing International Corp
SPIE Involvement:
Author
Publications (23)

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Finite-difference time-domain method, Optical lithography, Image processing, Image acquisition, Photomasks, Critical dimension metrology, Semiconducting wafers, Electromagnetism, 3D image processing, Maxwell's equations

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Data modeling, Calibration, Metals, Image processing, Manufacturing, Scanning electron microscopy, Optical proximity correction, Semiconducting wafers, Process modeling, Design for manufacturability

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Silicon, Manufacturing, Scanning electron microscopy, Photomasks, Semiconductor manufacturing, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Data modeling, Calibration, Manufacturing, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Databases, Scanners, Printing, Image quality, Photomasks, Image enhancement, Optical proximity correction, SRAF, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Mathematical modeling, Optical lithography, Data modeling, Calibration, Silicon, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling, Process modeling

Showing 5 of 23 publications
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