Chia-Tsung Hung
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Lithography, Data modeling, Process control, Double patterning technology, Optical alignment, Algorithm development, Semiconducting wafers, Overlay metrology, Current controlled current source

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