Dr. Chia-Yun Hsieh
at Air Liquide Electronics
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 6 April 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

Proceedings Article | 29 March 2019 Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Extreme ultraviolet, Plasma treatment, Line width roughness, Line edge roughness, Photoresist materials, Integrated circuits, Immersion lithography, 193nm lithography, Lithography, Lead

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