Dr. Chia-Yun Hsieh
at TEL Technology Ctr America LLC
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 29 March 2019
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Integrated circuits, Immersion lithography, Line edge roughness, Plasma treatment, 193nm lithography, Lead

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top