Dr. Chia Tseng
at Applied Materials China
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Roads, Etching, Polymers, Image processing, Scanning electron microscopy, Optical proximity correction, Reactive ion etching, Neodymium, Semiconducting wafers, Photoresist developing

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