Dr. Chidam G. Kallingal
Manager, TD Global Engineering Support at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Image processing, Photomasks, Machine learning, Source mask optimization, Computational lithography, Optical proximity correction, SRAF, Model-based design

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Logic, Genetic algorithms, Matrices, Image processing, Silicon, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Algorithm development, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Manufacturing, Photomasks, Optical proximity correction, SRAF, Neodymium, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Diffraction, Data modeling, Calibration, Metals, Error analysis, 3D modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Performance modeling

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Diffraction, Reticles, Optical lithography, Polarization, Fourier transforms, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Cadmium, Data modeling, Calibration, Diffusion, Optical proximity correction, Critical dimension metrology, Optimization (mathematics), Photoresist processing, Semiconducting wafers, Model-based design

Showing 5 of 10 publications
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