Dr. Chie Shishido
Senior Researcher at Hitachi Ltd
SPIE Involvement:
Author
Publications (18)

SPIE Journal Paper | 1 October 2011
JM3 Vol. 10 Issue 04
KEYWORDS: Scanning electron microscopy, Model-based design, Monte Carlo methods, Calibration, Cadmium, Mathematical modeling, 3D metrology, Scatterometry, Semiconducting wafers, Metrology

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Cadmium, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Finite element methods, Terbium, Double patterning technology, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Mathematical modeling, Calibration, Silicon, Scanning electron microscopy, Scatterometry, Monte Carlo methods, 3D metrology, Semiconducting wafers, Model-based design, 3D image processing

SPIE Journal Paper | 1 January 2011
JM3 Vol. 10 Issue 1
KEYWORDS: Critical dimension metrology, Atomic force microscopy, Scanning electron microscopy, Critical dimension scanning electron microscopy, Monte Carlo methods, Model-based design, Silicon, Statistical analysis, Cadmium, Image processing

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Statistical analysis, Cadmium, Scattering, Image processing, Silicon, Atomic force microscopy, Scanning electron microscopy, Monte Carlo methods, Critical dimension metrology, Model-based design

Showing 5 of 18 publications
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