Dr. Chien-Cheng Chen
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Photomasks, Vestigial sideband modulation, Monte Carlo methods, Model-based design, Beam shaping, Critical dimension metrology, Electron beam lithography, Lithography, Process modeling, Optical lithography

SPIE Journal Paper | 3 June 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Photomasks, Image registration, Mask making, Palladium, Monte Carlo methods, Quartz, Model-based design, Scattering, Electron beam lithography, Holmium

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Transmission electron microscopy, Atomic force microscopy, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Lithography, Metrology, Modeling, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Image registration, Photomasks, Mask making, Electron beam lithography, Optical lithography, Electrons, Quartz, Pellicles, Scattering, Etching

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