Chien-Hsien S. Lee
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Computational modeling, Calibration, Wavefronts, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 29 March 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Optical lithography, Etching, Metals, Dielectrics, Photomasks, Double patterning technology, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Back end of line

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Deep ultraviolet, Etching, Photomasks, Immersion lithography, Reactive ion etching, Semiconducting wafers, 193nm lithography, Chemical mechanical planarization, Back end of line

Proceedings Article | 16 April 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Semiconductors, Lithography, Polymers, Annealing, Dielectrics, Coating, Manufacturing, Fourier transforms, Head-mounted displays, Semiconducting wafers

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Gold, Lithography, Copper, Photoresist materials, Solids, Plating, Thin film coatings, Semiconducting wafers, Electroplating, Photoresist developing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top