Chien-Ming Wang
Senior Manager at ASML
SPIE Involvement:
Publications (6)

Proceedings Article | 14 March 2006 Paper
Proceedings Volume 6156, 61560W (2006)
KEYWORDS: Process modeling, Finite element methods, Semiconducting wafers, Data modeling, Photomasks, Lithography, Manufacturing, Calibration, Photoresist processing, Inspection

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001)
KEYWORDS: Photomasks, Semiconducting wafers, Binary data, Optical lithography, Lithography, Manufacturing, Phase shifts, Critical dimension metrology, Very large scale integration, Reticles

Proceedings Article | 30 December 1999 Paper
Chunhung Wu, David Wang, Chien-Ming Wang, Li-Jui Chen, Shuo-Yen Chou, Clare Wu, Nathan Schumann, Reuven Falah, Wolfgang Staud
Proceedings Volume 3873, (1999)
KEYWORDS: Inspection, Scattering, Optical proximity correction, Photomasks, Transmittance, Reticles, Glasses, Binary data, Critical dimension metrology, Phase shifts

Proceedings Article | 26 July 1999 Paper
Chin Hsia, Tsai-Sheng Gau, Chuen-Huei Yang, Ru-Gun Liu, ChungHsing Chang, Li-Jui Chen, Chien-Ming Wang, J. Fung Chen, Bruce Smith, Gue-Wuu Hwang, JiannWen Lay, Dong-Yuan Goang
Proceedings Volume 3679, (1999)
KEYWORDS: Optical proximity correction, Lithographic illumination, Optical filters, Resolution enhancement technologies, Electroluminescence, Lithography, Optical lithography, Photomasks, Modulation, Calcium

Proceedings Article | 26 July 1999 Paper
Shuo-Yen Chou, Chien-Ming Wang, Chin Hsia, Li-Jui Chen, Gue-Wuu Hwang, Shyh-Dar Lee, Jen-Chung Lou
Proceedings Volume 3679, (1999)
KEYWORDS: Reflectivity, Critical dimension metrology, Oxides, Semiconducting wafers, Refractive index, Optical lithography, Lithography, Photoresist materials, Dielectrics, Silicon

Showing 5 of 6 publications
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