Chien-Ming Wang
Senior Manager at ASML San Jose
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 14 March 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Data modeling, Calibration, Manufacturing, Inspection, Finite element methods, Photomasks, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Reticles, Optical lithography, Manufacturing, Very large scale integration, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 30 December 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Reticles, Scattering, Glasses, Inspection, Transmittance, Photomasks, Optical proximity correction, Critical dimension metrology, Binary data, Phase shifts

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Optical filters, Optical lithography, Lithographic illumination, Modulation, Calcium, Electroluminescence, Photomasks, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 26 July 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Oxides, Lithography, Refractive index, Optical lithography, Dielectrics, Silicon, Reflectivity, Photoresist materials, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 29 June 1998
Proc. SPIE. 3334, Optical Microlithography XI
KEYWORDS: Lithography, Reticles, Phase shifting, Lithographic illumination, Deep ultraviolet, Optical proximity correction, Critical dimension metrology, Chlorine, Optical calibration, Resolution enhancement technologies

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top