Dr. Chien-Wen Lai
Section Manager at Taiwan Semiconductor Manufaturing Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Diffraction, Data modeling, Polarization, Signal attenuation, Pellicles, Projection systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Genetic algorithms, Image segmentation, Artificial neural networks, Neural networks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Model-based design

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Optical lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Algorithm development

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Wafer-level optics, Lithography, Genetic algorithms, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design

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