Mr. Chih-Hao Huang Profile

Chih-Hao Huang

Inventor at Macronix International Co Ltd

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Author

Publications (8)

Proceedings Article | 27 March 2017

Pattern collapse solution for asymmetric pattern

C. J. Tu, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen

Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV

KEYWORDS: Antireflective coatings, Optical lithography, Metals, Capillaries, Copper, Interfaces, Coating, Photoresist materials, Process control, Semiconducting wafers, Photoresist developing, Back end of line

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Proceedings Article | 18 March 2015

Reducing the substrate dependent scanner leveling effect in low-k1 contact printing

C. S. Chang, C. F. Tseng, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen

Proc. SPIE. 9426, Optical Microlithography XXVIII

KEYWORDS: Near infrared, Opacity, Sensors, Etching, Scanners, Dielectrics, Silicon, Printing, Semiconducting wafers, Chemical mechanical planarization

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Proceedings Article | 29 March 2013

PEB to development delay influence on contact patterning by negative tone development process

C. Chen, C. Lin, C. Huang, Elvis Yang, T. Yang, Chih-Yuan Lu

Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX

KEYWORDS: Optical lithography, Contamination, Polymers, Diffusion, Manufacturing, Printing, Compact discs, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 3 April 2012

Overlay target design and evaluation for SADP process

C. Yeh, Chao-Tien Huang, Kengchi Lin, C. Huang, Elvis Yang, T. Yang, K. Chen, Chih-Yuan Lu

Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI

KEYWORDS: Lithography, Etching, Image segmentation, Image processing, Coating, Scanning electron microscopy, Scatterometry, Photomasks, Semiconducting wafers, Overlay metrology

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Proceedings Article | 21 April 2011

Process solutions for reducing PR residue over non-planar wafer

C. H. Lin, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV

KEYWORDS: Optical lithography, Etching, Image processing, Coating, Reflectivity, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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Proceedings Article | 20 April 2011

Wafer-edge defect reduction for tri-layer materials in BEOL applications

J. R. Du, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV

KEYWORDS: Lithography, Optical lithography, Etching, Silicon, Coating, Reflectivity, Plasma etching, Photoresist processing, Semiconducting wafers, Back end of line

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Proceedings Article | 1 April 2009

Contact formation with extremely low proximity effect by double patterning technology

C. W. Yeh, S. S. Yu, H. J. Lee, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Chih-Yuan Lu

Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI

KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Dielectrics, Photoresist materials, Photomasks, Double patterning technology, Immersion lithography, Semiconducting wafers

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Proceedings Article | 5 April 2007

The novel advanced process control to eliminate AlCu-PVD induced overlay shift

CH Huang, CC Yang, Elvis Yang, TH Yang, KC Chen, Joseph Ku, CY Lu

Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI

KEYWORDS: Etching, Metals, Tungsten, Image registration, Process control, Semiconducting wafers, Tolerancing, Overlay metrology, Model-based design, Chemical mechanical planarization

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Showing 5 of 8 publications

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