Chih-I Wei
at Siemens EDA
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510Q (2023) https://doi.org/10.1117/12.2687822
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Semiconducting wafers, Scanning electron microscopy, Printing, Modeling, Machine learning, Data modeling

SPIE Journal Paper | 19 October 2023
JM3, Vol. 22, Issue 04, 041603, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041603
KEYWORDS: Modeling, Data modeling, Semiconducting wafers, Optical proximity correction, Contour modeling, Metrology, Calibration, Stochastic processes, Scanning electron microscopy, Performance modeling

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124950A (2023) https://doi.org/10.1117/12.2660413
KEYWORDS: Photomasks, Extreme ultraviolet, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Lithography, Optical lithography, Capacitors, Semiconducting wafers, SRAF

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950S (2023) https://doi.org/10.1117/12.2660763
KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249419 (2023) https://doi.org/10.1117/12.2658651
KEYWORDS: Failure analysis, Stochastic processes, Monte Carlo methods, Extreme ultraviolet lithography, Extreme ultraviolet, Statistical analysis, Optical proximity correction, Error analysis

Showing 5 of 19 publications
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